WebbOFPR-800LB (東京応化社製) 基板サイズ. Φ4インチシリコンウエハ. ターゲット膜厚. 1μm. 膜厚分布. ±0.8%. スピンコーターMS-B100の製品案内はこちら >>. タグ: スピン … WebbPURPOSE:To highly precisely form a pattern while controlling the taper angle of the end by using a lift-off method. CONSTITUTION:A masking material 4 to be lifted off with the inverted taper controlled and having an undercut part is prepared, a thin film 5 is formed on the material 4 by sputtering, then the material is lifted off, and a pattern with the end …
ノボラック系ポジ型レジストにおけるプリベーク温度が現像特性 …
WebbJP3540503B2 JP9700596A JP9700596A JP3540503B2 JP 3540503 B2 JP3540503 B2 JP 3540503B2 JP 9700596 A JP9700596 A JP 9700596A JP 9700596 A JP9700596 A JP 9700596A JP 3540503 B2 JP3540503 B2 JP 3540503B2 Authority JP Japan Prior art keywords photoresist film film light positive negative Prior art date 1996-04-18 Legal … WebbPURPOSE:To provide a semiconductor device manufacturing method with which the residue generated on the surface of the film to be etched can be removed completely after a resist pattern has been removed by ashing. CONSTITUTION:A resist pattern 3 is formed on the film 2 to be etched which is formed on a semiconductor substrate 1. After an … create cluster performance history volume
Improvement of electron emission characteristics of Si field emitter ...
Webb24 feb. 2003 · We developed a dry-etching process to form holes with diameters of 5–50 μm in 7-μm thick a-Si/SiO2 three-dimensional (3D) photonic crystal layers fabr… WebbComponents include Si substrate (dark cyan), OFPR8600 photoresist (pink), Cr layer (faded cyan), nanowires (gray) and PDMS (transparent cyan). (h) A schematic … Webb18 apr. 1996 · 【0038】 まず、図1(a)に示すように、GaAs半導体基板等の半導体結晶体(材料体)1の主面上に、ポジ型フォトレジストとしてのキノンジアジド系フォト … create cluster windows server 2019